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Nitrogen doped graphene has been created at our facilities. Ideal for exfoliation. Nitrogen doping is fixed at 1.5-2% and the lateral sizes of the flakes can reach more than 50 microns.
制备方法:层间催化裂解法 厚度:1~5nm 直径:~5um 比表面积:90-130 m2/g 外观:黑色粉末
制备方法: 层间催化裂解法 厚度:~2nm 直径:5~10um 纯度:98% 含氧量:1.44% 电导率:~2597 s/cm
Carboxyl (-COOH) functionalized graphene has been developed at our facilities. Can be deposited on various substrates either by conventional mechanical exfoliation or spin coating in the solution
Semiconductor analog of graphene: Graphene oxide has been synthesized at our R&D facilities using modified reaction Hummer technique.
Graphene fluoride has been developed our facilities. Carbon to Fluoride ratio is 1:1 and the particle size ranges from 1-15 microns. Electrical resistivity is 1E11-1E12 Ohm.cm.