二氧化硅衬底的全区域覆盖的单层二硫化钼

简要描述：This product contains full area coverage MoS2 monolayers on SiO2/Si substrates. Sample size measures 1cm in size and the entire sample surface contains monolayer thick MoS2 sheet.

更新时间：2022-07-15
产品型号：
厂商性质：生产厂家
访问量：511

产品咨询 bd半岛电竞登陆

产品分类

二维材料

钙钛矿/OLED 异质结 MOFS材料其他二维材料二维材料溶液 bd半岛公司 bandao半岛电子绝缘体黑磷六方氮化硼晶体碲化物晶体硒化物晶体硫化物晶体查看全部产品

详细介绍

This product contains full area coverage MoS2 monolayers on SiO2/Si substrates. Sample size measures 1cm in size and the entire sample surface contains monolayer thick MoS2 sheet. Synthesized full area coverage monolayer MoS2 is highly luminescent and Raman spectroscopy studies also confirm the monolayer thickness. In comparison to full area coverage MoS2 on sapphire, full area coverage MoS2 on SiO2/Si display higher PL intensity.

Sample Properties.

Sample size	1cm x 1cm square shaped
Substrate type	Thermal oxide (SiO2/Si) substrates
Coverage	Full Coverage Monolayer
Electrical properties	1.85 eV Direct Bandgap Semiconductor
Crystal structure	Hexagonal Phase
Unit cell parameters	a = b = 0.313 nm, c = 1.230 nm, α = β = 90°, γ = 120°
Production method	Atmospheric Pressure Chemical Vapor Deposition (APCVD)
Characterization methods	Raman, photoluminescence, TEM, EDS

Specifications

1)Identification.Full coverage 100% monolayer MoS2 uniformly covered across SiO2/Si substrates.

2)Physical dimensions. One centimeter in size. Larger sizes up to 2-inch wafer-scale available upon requests.

3)Smoothness.Atomically smooth surface with roughness < 0.2 nm.

4)Uniformity.Highly uniform surface morphology. MoS2 monolayers uniformly cover across the SiO2/Si substrates.

5)Purity.99.9995% purity as determined by nano-SIMS measurements

6)Reliability.Repeatable Raman and photoluminescence response

7)Crystallinity.High crystalline quality, Raman response, and photoluminescence emission comparable to single crystalline monolayer flakes.

8)Substrate.SiO2/Si substrates. But our research and development team can transfer MoS2 monolayers onto variety of substrates including PET and quartz without significant compromisation of material quality.

9)Defect profile.MoS2 monolayers do not contain intentional dopants or defects. However, our technical staff can produce defected MoS2 using α-bombardment technique.

Supporting datasets[for 100% Full area coverage on SiO2/Si]

Transmission electron images (TEM) acquired from CVD grown full area coverage MoS2 monolayers on SiO2/Si confirming highly crystalline nature of monolayers

Energy dispersive X-ray spectroscopy (EDX) characterization on CVD grown full area coverage MoS2 on SiO2/Si confirming Mo:S 1:2 ratios

Room temperature photoluminescence spectroscopy (PL) and Raman spectroscopy (Raman) measurements performed on CVD grown full area coverage MoS2 monolayers on SiO2/Si. Raman spectroscopy measurement confirm monolayer nature of the CVD grown samples and PL spectrum display sharp and bright PL peak located at 1.85 eV in agreement with the literature.

产品咨询

留言框

产品：
您的单位：
您的姓名：
联系电话：
常用邮箱：
省份：
详细地址：
补充说明：
验证码：

请输入计算结果（填写阿拉伯数字），如：三加四=7

上一篇：基于蓝宝石衬底的全区域覆盖的单层二硫化铼
下一篇：蓝宝石衬底的全区域覆盖的单层二硫化钼

二氧化硅衬底的全区域覆盖的单层二硫化钼

留言框

产品：

您的单位：

您的姓名：

联系电话：

常用邮箱：

省份：

详细地址：

补充说明：

验证码：